| High Pressure Pump | |
| Working pressure | 0 - 42 MPa |
| Flow range | 0.001 - 15.00 mL/min (maximum flow 50.00 mL/min, suitable for semi-prep) |
| Flow accuracy | RSD＜0.1% |
| Gradient range | Isocratic, binary gradient |
| Gradient accuracy | ±1% |
| Column Oven | |
| Temperature range | Semiconductor cooling 5℃~80℃ (ambient temperature <25℃) |
| Temperature accuracy | ±0.1℃ |
| The oven can simultaneously install two different columns (15 cm, 20 cm, 25 cm, 30 cm) | |
| UV-Vis Detector | |
| Light source | Deuterium lamp |
| Wavelength range | 190 – 700 nm |
| Spectral bandwidth | 5 nm |
| Wavelength indication error | ±0.1 nm |
| Wavelength accuracy | ≤0.2 nm |
| Wavelength scanning | Multi-wavelength programming (10 wavelength ranges) |
| Range of linearity | ＞104 |
| Noise | <1×10-5 AU (empty cell), <1.5×10-5 AU (with mobile phase, dynamic) |
| Drift | ＜3×10-6 AU (empty cell), ＜3×10-4 AU (with mobile phase, dynamic) |
| Cell width | 4.5 mm |
| Minimum detectable concentration | 5×10-9 g/mL (naphthalene) |
AS-401 HPLC Autosampler
| Specifications | |
| Sample positions | 2×60 positions, 1.8 mL vials |
| Minimum injection volume | 0.1 μL (250μL standard sample pump) |
| Injection pump | 100 μL, 250μL (standard), 1 mL ... |
| Sampling loop volumn | 100μL (standard), 20μL, 50μL, 200μL (options) |
| Switching rate of sampling valve | < 100 ms |
| Position accuracy | < 0.3 mm |
| Motion control method | XYZ 3-dimension coordinate system |
| Injector cleaning method | Inside and outside rinse, no restrictions on rinse times |
| Number of replicates | No restrictions on replicates |
| Dimensions | 300 (W)×230 (H)×505 (D) mm |
| Power | AC 220 V, 50 Hz |
| Compatibility | Compatible with all commercial HPLC / IC systems |
| Temperature range | 10 - 40℃ |
| pH range | 1-14 |
